[x]
Thrust/Theme
PatMat – Patterning Materials
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GRC Science Area
MPS – Material & Process Sciences
[x]
Content Type
Patent Filings
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1 through 2 of
2 similar documents, best matches first. |
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- 1:
Photoresist Compositions Comprising Norbornene Derivative Polymers...
- Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB Find Similar Documents
- 2:
Attenuated Phase Shift Mask and a Method for Making the Mask...
- Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB Find Similar Documents
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