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GRC Science Area
NMS – Nanomanufacturing Sciences
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- 1:
TECHCON 2013 (Event E004683) - SRC
- TECHCON 2013 Date: Monday, Sept. 9, 2013, 8 a.m. - Tuesday, Sept. 10, 2013, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004683 E004683 image ...
URL: https://www.src.org/calendar/e004683/
Modified: 2014-03-10 - 136KB
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- 2:
TECHCON 2012 (Event E004114) - SRC
- TECHCON 2012 Date: Monday, Sept. 10, 2012, 8 a.m. - Tuesday, Sept. 11, 2012, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004114 E004114 ...
URL: https://www.src.org/calendar/e004114/
Modified: 2013-03-11 - 98KB
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- 3:
TECHCON 2011 (Event E004113) - SRC
- TECHCON 2011 Date: Monday, Sept. 12, 2011, 8 a.m. - Tuesday, Sept. 13, 2011, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004113 E004113 ...
URL: https://www.src.org/calendar/e004113/
Modified: 2012-03-13 - 97KB
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- 4:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 26, 2014, 7:30 a.m. - Thursday, March 27, 2014, 8 p.m. MT Location: ...
URL: https://www.src.org/calendar/e005160/
Modified: 2014-09-27 - 66KB
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- 5:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 20, 2013, 7 a.m. - Thursday, March 21, 2013, 2 p.m. MT Location: ...
URL: https://www.src.org/calendar/e004929/
Modified: 2013-09-21 - 61KB
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- 6:
System and Method Converting the Polarization State of an Optical...
- System and Method Converting the Polarization State of an Optical Beam into an Inhomogenously Polarized State Application Type: Utility Patent Number: 7414786 Country: United ...
URL: https://www.src.org/library/patent/p0496/
Modified: 2008-08-19 - 24KB
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- 7:
Enhanced Stripping of Implanted Resists (Patent P1259) - SRC
- Enhanced Stripping of Implanted Resists Application Type: Utility Patent Number: 8772170 Country: United States Status: Filed on 29-Dec-2010, Issued on 8-Jul-2014, Patent Abandoned ...
URL: https://www.src.org/library/patent/p1259/
Modified: 2014-07-08 - 25KB
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- 8:
GRC SEMATECH Engineering Research Center for Environmentally...
- GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, March 20, 2012, 4 p.m. - Thursday, March 22, 2012, 2 p.m. MT ...
URL: https://www.src.org/calendar/e004390/
Modified: 2012-09-22 - 78KB
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- 9:
GRC SEMATECH Engineering Research Center for Environmentally...
- GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Site Review Date: Wednesday, March 9, 2011, 8 a.m. - Friday, March 11, 2011, 5 p.m. ...
URL: https://www.src.org/calendar/e003989/
Modified: 2011-09-11 - 73KB
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- 10:
 Slide 1
- ITRS - Deterministic Doping, Thomas Schenkel, LBNL, Nov. 12, 2010 Single Ion Implantation Thomas Schenkel Lawrence Berkeley National Laboratory T_Schenkel@LBL.gov ITRS - ...
URL: https://www.src.org/calendar/e004100/e004100-00-session2.pdf
Modified: 2010-11-29 - 52.6MB
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- 11:
Methods of Forming Graphene/(Multilayer) Boron Nitride for Electronic...
- Methods of Forming Graphene/(Multilayer) Boron Nitride for Electronic Device Applications Application Type: Utility Patent Number: 8158200 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1170/
Modified: 2012-04-17 - 24KB
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- 12:
Modification of Polyvinylidene Fluoride Membrane and Method of...
- Modification of Polyvinylidene Fluoride Membrane and Method of Filtering Application Type: Utility Patent Number: 5531900 Country: United States Status: Filed on 7-Jul-1994, Issued ...
URL: https://www.src.org/library/patent/p0020/
Modified: 1996-07-02 - 22KB
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- 13:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Continuation (in part) Patent Number: 5637544 Country: ...
URL: https://www.src.org/library/patent/p0011/
Modified: 1997-06-10 - 25KB
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- 14:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Divisional Patent Number: 5635148 Country: United States ...
URL: https://www.src.org/library/patent/p0009/
Modified: 1997-06-03 - 25KB
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- 15:
Method for Improving Spatial Resolution and Accuracy in Scanning...
- Method for Improving Spatial Resolution and Accuracy in Scanning Probe Microscopy Application Type: Utility Patent Number: 6210982 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0192/
Modified: 2001-04-03 - 22KB
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- 16:
TECHCON 2010 Preview - SRC
- TECHCON 2010 Preview TECHCON is the primary event where SRC presents the best of research sponsored by the membership and showcases the students who perform the research. It is ...
URL: https://www.src.org/calendar/e003428/preview/
Modified: 2010-07-28 - 24KB
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- 17:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials Application Type: Divisional Patent Number: 8501304 Country: United ...
URL: https://www.src.org/library/patent/p1333/
Modified: 2013-08-06 - 25KB
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- 18:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials Application Type: Utility Patent Number: 8133534 Country: United ...
URL: https://www.src.org/library/patent/p1043/
Modified: 2012-03-13 - 25KB
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- 19:
Oriented Crystal Nanowire Interconnects (Patent P1479) - SRC
- Oriented Crystal Nanowire Interconnects Application Type: Utility Patent Number: 9117821 Country: United States Status: Filed on 11-Mar-2014, Issued on 25-Aug-2015, Patent ...
URL: https://www.src.org/library/patent/p1479/
Modified: 2015-08-25 - 23KB
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- 20:
GRAPHENE/(MULTILAYER) BORON NITRIDE HETEROEPITAXY FOR ELECTRONIC...
- GRAPHENE/(MULTILAYER) BORON NITRIDE HETEROEPITAXY FOR ELECTRONIC DEVICE APPLICATIONS Application Type: Divisional Patent Number: 8338825 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1311/
Modified: 2012-12-25 - 24KB
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- 21:
Graphene (Multiplayer) Boron Niride Heteroepitaxy for Electronic...
- Graphene (Multiplayer) Boron Niride Heteroepitaxy for Electronic Device Applications Application Type: Continuation Patent Number: 8946692 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1500/
Modified: 2015-02-03 - 24KB
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- 22:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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- 23:
NMS Nanoengineered Materials Annual Review (Event E004780) -...
- NMS Nanoengineered Materials Annual Review Date: Tuesday, June 12, 2012 - Wednesday, June 13, 2012 Location: Dean's Suite 290, College of Business, 1307 West Highland St., ...
URL: https://www.src.org/calendar/e004780/
Modified: 2012-12-13 - 57KB
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- 24:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, April 5, 2016, 7 a.m.-4:30 p.m. MT Location: Marriott University Park ...
URL: https://www.src.org/calendar/e005906/
Modified: 2016-10-05 - 49KB
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- 25:
The Challenges and Opportunities of Atomic Layer Etching (Event...
- The Challenges and Opportunities of Atomic Layer Etching Date: Thursday, May 5, 2016, 2 p.m.-3 p.m. ET Location: University of Arizona, Tucson, AZ, United States Type: e-Workshop ...
URL: https://www.src.org/calendar/e005904/
Modified: 2016-11-05 - 34KB
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- 26:
Microsoft Word - Executive Summary Naydenov
- 1 Participants only: Not for distribution. 2nd Deterministic Doping Workshop November 12, 2010, UC Berkeley Executive Summary Title: Nitrogen-Vacancy Centers in Diamond - ...
URL: https://www.src.org/...100-13-executive-summary-naydenov.pdf
Modified: 2010-11-09 - 91KB
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- 27:
TECHCON 2010 Best in Session Awards - SRC
- TECHCON 2010 Best in Session Awards Seventeen students received Best in Session Awards at TECHCON 2010, presented by Dr. Michael Mayberry, Intel, SRC Board of Directors Member ...
URL: https://www.src.org/calendar/e003428/best-in-session/
Modified: 2010-09-29 - 26KB
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- 28:
NMS Patterning Review Agenda
- NMS Patterning Review Agenda Date: Tuesday, October 4, 2011 - Thursday, October 6, 2011 Location: The Solution Center, Durham, NC 27703 Tuesday, October 4, 2011 7:30 - 8:30 a.m. ...
URL: https://www.src.org/calendar/e004187/e004187-agenda.pdf
Modified: 2011-09-22 - 44KB
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- 29:
Microsoft Word - ITRSpaperfinal.doc
- Transport metrology for ultra-scaled MOSFETs G.C. Tettamanzi 1,* , G.P. Lansbergen 1 , J. Verduijn 1 , R. Rahman 2 , A. Paul 2 , S. Lee 2 N. Collaert 3 , S. Biesemans 3 , G. ...
URL: https://www.src.org/...004100-09-executive-summary-rogge.pdf
Modified: 2010-11-09 - 356KB
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- 30:
Microsoft Word - Executive Summary Andrea Morello
- Participants o Title: Dr. Name(s): An Affiliation(s) The Universi Introduction Doping semi properties of to dopants al of spintronic (1) The progr (2) The poss atoms in clas The ...
URL: https://www.src.org/...4100-12-executive-summary-morello.pdf
Modified: 2010-11-09 - 70KB
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