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IMPACT-T1 – Materials for Scaled Reconfigurable and mm-Wave Interconnects
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- 1:
Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated...
- Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated Circuits (ICS) Application Type: Utility Country: United States Status: Filed on 8-Dec-2021, Published by Patent ...
URL: https://www.src.org/library/patent/p2000/
Modified: 2021-12-08 - 23KB Find Similar Documents
- 2:
Low-Power Phase Change Memory Technology with Interfacial Thermoelectr...
- Low-Power Phase Change Memory Technology with Interfacial Thermoelectric Heating Enhancement Application Type: Utility Country: United States Status: Filed on 11-Oct-2021, ...
URL: https://www.src.org/library/patent/p1975/
Modified: 2021-10-11 - 24KB Find Similar Documents
- 3:
Semiconductor Research Corporation - SRC
- nCORE nCORE Nanoelectronic Computing Research Explore fundamental materials, devices, and interconnect solutions to enable future computing and storage paradigms beyond ...
URL: https://www.src.org/program/ncore/
Modified: 2023-10-10 - 30KB Find Similar Documents
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