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1 through 3 of 3 similar documents, best matches first.

1: METHOD FOR CORRECTING A MASK DESIGN LAYOUT (Patent P1708) - SRC: METHOD FOR CORRECTING A MASK DESIGN LAYOUT Application Type: Utility Patent Number: 7149999 Country: United States Status: Filed on 25-Feb-2004, Issued on 12-Dec-2006, Patent ...
URL: https://www.src.org/library/patent/p1708/
Modified: 2006-12-12 - 23KB
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2: Method for Correcting a Mask Design Layout (Patent P0386) - SRC: Method for Correcting a Mask Design Layout Application Type: Utility Patent Number: 7149999 Country: United States Status: Filed on 25-Feb-2004, Issued on 12-Dec-2006, Patent ...
URL: https://www.src.org/library/patent/p0386/
Modified: 2006-12-12 - 23KB
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3: India Design Review (Event E005563) - SRC: India Design Review Date: Wednesday, Jan. 7, 2015, 6 p.m. - Thursday, Jan. 8, 2015, 5 p.m. Local Location: Hyatt Bangalore, 1/1, Swami Vivekananda Road, Off M.G. Road, Ulsoor, ...
URL: https://www.src.org/calendar/e005563/
Modified: 2015-02-04 - 82KB
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