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Multi-level Interconnect

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1: Selective Low Temperature Chemical Vapor Deposition of Titanium...: Selective Low Temperature Chemical Vapor Deposition of Titanium Disilicide onto Silicon Regions Application Type: Utility Patent Number: 5633036 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0055/
Modified: 1997-05-27 - 21KB
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2: Process and Apparatus for the Use of Solid Precursor Sources...: Process and Apparatus for the Use of Solid Precursor Sources in Liquid Form for Vapor Deposition of Materials Application Type: Utility Patent Number: 5376409 Country: United ...
URL: https://www.src.org/library/patent/p0261/
Modified: 1994-12-27 - 22KB
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