Questions?
[x] Content Type
Patent Filings
[x] Thrust/Theme
Masks
SRC Program
GRC 3
GRC Science Area
LIT – Lithography Sciences 3
NMS – Nanomanufacturing Sciences 3
1 through 3 of 3 similar documents, best matches first.   
1: Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB
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2: Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB
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3: Twin Mask, and Method and System for Using Same to Pattern Microelectr...
Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB
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