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- 1:
Bio - Priyadarshini Panda - SRC
- Bio: Priyadarshini Panda Priyadarshini Panda Priyadarshini Panda is a Ph.D. student at Purdue University working with Prof. Kaushik Roy. She will be graduating in July 2019 and ...
URL: https://www.src.org/...ndar/e006797/priyadarshini-panda-bio/
Modified: 2019-05-07 - 19KB
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- 2:
Bio - Kaushik Roy - SRC
- Bio: Kaushik Roy Kaushik Roy Kaushik Roy received B.Tech. degree in electronics and electrical communications engineering from the Indian Institute of Technology, Kharagpur, India, ...
URL: https://www.src.org/calendar/e006797/kaushik-roy-bio/
Modified: 2019-05-07 - 20KB
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- 3:
Pattering Electronic Devices Reactive-Ion Etching of Tin Oxides...
- Pattering Electronic Devices Reactive-Ion Etching of Tin Oxides Application Type: Continuation Country: United States Status: Filed on 9-Dec-2020, Published by Patent Office ...
URL: https://www.src.org/library/patent/p1946/
Modified: 2020-12-09 - 29KB
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- 4:
Patterning Electronic Devices using Reactive-Ion Etching of Tin...
- Patterning Electronic Devices using Reactive-Ion Etching of Tin Oxides Application Type: Utility Patent Number: 10868191 Country: United States Status: Filed on 6-Dec-2019, ...
URL: https://www.src.org/library/patent/p1879/
Modified: 2020-12-15 - 28KB
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- 5:
Micron Scale Tin Oxide-Based Semiconductor Devices (Patent P1886...
- Micron Scale Tin Oxide-Based Semiconductor Devices Application Type: Utility Patent Number: 11217700 Country: United States Status: Filed on 6-Dec-2019, Published by Patent Office ...
URL: https://www.src.org/library/patent/p1886/
Modified: 2022-01-04 - 28KB
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- 6:
Micron Scale Tin Oxide-Based Semiconductor Devices (Patent P2041...
- Micron Scale Tin Oxide-Based Semiconductor Devices Application Type: Continuation Country: United States Status: Filed on 4-Jan-2022, Published by Patent Office Organization: ...
URL: https://www.src.org/library/patent/p2041/
Modified: 2022-01-04 - 28KB
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- 7:
Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process...
- Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process and Related Structures Application Type: Utility Country: United States Status: Filed on 6-Dec-2022, Published ...
URL: https://www.src.org/library/patent/p2099/
Modified: 2022-12-06 - 23KB
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