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1 through 24 of 24 similar documents, best matches first.

1: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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2: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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3: Molecular Transfer Printing Using Block Copolymers (Patent P1163...: Molecular Transfer Printing Using Block Copolymers Application Type: Utility Patent Number: 8133341 Country: United States Status: Filed on 1-Apr-2009, Issued on 13-Mar-2012, ...
URL: https://www.src.org/library/patent/p1163/
Modified: 2012-03-13 - 26KB
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4: Molecular Transfer Printing Using Block Copolymers (Patent P1181...: Molecular Transfer Printing Using Block Copolymers Application Type: Patent Cooperation Treaty Patent Number: PCT/US20090392 Status: Filed on 14-May-2009, Issued on 26-Feb-2011, ...
URL: https://www.src.org/library/patent/p1181/
Modified: 2011-02-26 - 26KB
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5: Molecular Glass Photoresists (Patent P0566) - SRC: Molecular Glass Photoresists Application Type: Utility Patent Number: 7452658 Country: United States Status: Filed on 16-Feb-2006, Issued on 18-Nov-2008, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0566/
Modified: 2008-11-18 - 23KB
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6: Optical Proximity Correction Using Regression (Patent P1118)...: Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB
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7: Fabrication of Group III-Nitride Photocathode Having Cs Activation...: Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB
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8: Density Multiplication and Improved Lithography by Directed Block...: Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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9: Materials and Methods for Creating Imaging Layers (Patent P1140...: Materials and Methods for Creating Imaging Layers Application Type: Continuation Patent Number: 7851252 Country: United States Status: Filed on 17-Feb-2009, Issued on 14-Dec-2010, ...
URL: https://www.src.org/library/patent/p1140/
Modified: 2010-12-14 - 26KB
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10: Methods and Compositions for Forming Patterns with Isolated or...: Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials Application Type: Utility Patent Number: 8133534 Country: United ...
URL: https://www.src.org/library/patent/p1043/
Modified: 2012-03-13 - 25KB
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11: Fabrication of Complex Three-Dimensional Structures Based on...: Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials on Activated Two-Dimensional Templates Application Type: Continuation ...
URL: https://www.src.org/library/patent/p1446/
Modified: 2017-01-10 - 27KB
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12: Fabrication of Complex Three-Dimensional Structures Based on...: Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials On Activated Two-Dimensional Templates Application Type: Utility Patent ...
URL: https://www.src.org/library/patent/p0603/
Modified: 2012-05-01 - 27KB
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13: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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14: Double Hidden Flexure Microactuator for Phase Mirror Array (Patent...: Double Hidden Flexure Microactuator for Phase Mirror Array Application Type: Utility Patent Number: 7075699 Country: United States Status: Filed on 28-Sep-2004, Issued on ...
URL: https://www.src.org/library/patent/p0508/
Modified: 2006-07-11 - 22KB
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15: Phase-Shifting Test Mask Patterns for Characterizing Illumination...: Phase-Shifting Test Mask Patterns for Characterizing Illumination and Mask Quality in Image Forming Optical Systems Application Type: Utility Patent Number: 7648802 Country: United ...
URL: https://www.src.org/library/patent/p0514/
Modified: 2010-01-19 - 23KB
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16: CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...: CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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17: Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography...: Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography Application Type: Utility Patent Number: 7092138 Country: United States Status: Filed on 8-Oct-2004, Issued ...
URL: https://www.src.org/library/patent/p0491/
Modified: 2006-08-15 - 22KB
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18: Fabrication of Complex Three-Dimensional Structures Based on...: Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials On Activated Two-Dimensional Templates Application Type: Continuation ...
URL: https://www.src.org/library/patent/p1340/
Modified: 2014-01-07 - 27KB
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19: Compounds Containing a Thiol Protected Group Bonded to a Protecting...: Compounds Containing a Thiol Protected Group Bonded to a Protecting Group Via a Polarized bond, and Structure Comprising the Compounds on its Surface. Application Type: Utility ...
URL: https://www.src.org/library/patent/p0613/
Modified: 2010-03-30 - 22KB
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20: Method of Locating Areas in an Image Such as a Photo Mask Layout...: Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB
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21: DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK...: DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY Application Type: Patent Cooperation Treaty Patent Number: 10438626 Status: Filed on ...
URL: https://www.src.org/library/patent/p1132/
Modified: 2010-04-17 - 26KB
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22: Materials and Methods for Creating Imaging Layers (Patent P1002...: Materials and Methods for Creating Imaging Layers Application Type: European Patent Office Patent Number: 06251517.6 Status: Filed on 22-Mar-2006, Issued on 13-Oct-2009 ...
URL: https://www.src.org/library/patent/p1002/
Modified: 2009-10-13 - 26KB
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23: Materials and Methods for Creating Imaging Layers (Patent P0626...: Materials and Methods for Creating Imaging Layers Application Type: Utility Patent Number: 7514764 Country: United States Status: Filed on 21-Mar-2006, Issued on 7-Apr-2009 ...
URL: https://www.src.org/library/patent/p0626/
Modified: 2009-04-07 - 26KB
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24: Methods and Compositions for Forming Patterns with Isolated or...: Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials Application Type: Divisional Patent Number: 8501304 Country: United ...
URL: https://www.src.org/library/patent/p1333/
Modified: 2013-08-06 - 25KB
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1 through 24 of 24 similar documents, best matches first.