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Content Type
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SRC Program
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Thrust/Theme
| GRC Science Area |
| LIT – Lithography Sciences | 3 |
| NMS – Nanomanufacturing Sciences | 3 |
| 1 through 3 of 3 similar documents, best matches first. | ||
- 1: Methods and Compositions for Imaging Acids in Chemically Amplified...
- Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Divisional Patent Number: 6566030 Country: United ...
URL: https://www.src.org/library/patent/p0224/
Modified: 2003-05-20 - 23KB
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- 2: Methods and Compositions for Imaging Acids in Chemically Amplified...
- Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Utility Patent Number: 6376149 Country: United ...
URL: https://www.src.org/library/patent/p0088/
Modified: 2002-04-23 - 23KB
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- 3: Methods, Apparatus and Computer Program Products for Self-Calibrating...
- Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB
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