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- 1:
Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated...
- Atomic Layer Deposited (ALD) Oxide Semiconductors for Integrated Circuits (ICS) Application Type: Utility Country: United States Status: Filed on 8-Dec-2021, Published by Patent ...
URL: https://www.src.org/library/patent/p2000/
Modified: 2021-12-08 - 23KB
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- 2:
 IMPACT Center SAB/Liaison meetings
- IMPACT Center SAB/Liaison meetings May 7, 2020 Abstract Prof Suman Datta, Notre Dame BEOL Compatible Dual-Gate Ultra Thin-Body W-Doped Indium-Oxide Transistor We experimentally ...
URL: https://www.src.org/calendar/e007095/datta_abstract.pdf
Modified: 2020-04-30 - 55KB
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- 3:
Integrated Circuit With Topological Semimetal Interconnect (Patent...
- Integrated Circuit With Topological Semimetal Interconnect Application Type: Utility Country: United States Status: Filed on 20-Jul-2022, Published by Patent Office Organization: ...
URL: https://www.src.org/library/patent/p2088/
Modified: 2022-07-20 - 25KB
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