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- 1:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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- 2:
The Challenges and Opportunities of Atomic Layer Etching (Event...
- The Challenges and Opportunities of Atomic Layer Etching Date: Thursday, May 5, 2016, 2 p.m.-3 p.m. ET Location: University of Arizona, Tucson, AZ, United States Type: e-Workshop ...
URL: https://www.src.org/calendar/e005904/
Modified: 2016-11-05 - 34KB
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- 3:
TECHCON 2012 (Event E004114) - SRC
- TECHCON 2012 Date: Monday, Sept. 10, 2012, 8 a.m. - Tuesday, Sept. 11, 2012, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004114 E004114 ...
URL: https://www.src.org/calendar/e004114/
Modified: 2013-03-11 - 98KB
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