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Thrust/Theme
BEP – Back End Processes
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5 similar documents, best matches first. |
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- 1:
Low Dielectric Constant (Low-K) Dielectric and Method of Forming...
- Low Dielectric Constant (Low-K) Dielectric and Method of Forming The Same Application Type: Utility Patent Number: 10090150 Country: United States Status: Filed on 6-Sep-2017, ...
URL: https://www.src.org/library/patent/p1731/
Modified: 2018-10-02 - 24KB
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- 2:
Method of Forming Boron Carbo-Nitride Layers for Integrated Circuit...
- Method of Forming Boron Carbo-Nitride Layers for Integrated Circuit Devices Application Type: Utility Patent Number: 7144803 Country: United States Status: Filed on 16-Apr-2004, ...
URL: https://www.src.org/library/patent/p0451/
Modified: 2006-12-05 - 22KB
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- 3:
Wafer Fabrication Monitoring/Control System and Method (Patent...
- Wafer Fabrication Monitoring/Control System and Method Application Type: Utility Patent Number: 9366601 Country: United States Status: Filed on 15-Mar-2012, Issued on 14-Jun-2016 ...
URL: https://www.src.org/library/patent/p1332/
Modified: 2016-06-14 - 23KB
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- 4:
Conductors Created by Metal Deposition Using Selective Passivation...
- Conductors Created by Metal Deposition Using Selective Passivation Layer and Related Methods Application Type: Utility Patent Number: 7534967 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0447/
Modified: 2009-05-19 - 23KB
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- 5:
Low Temperature Metal Etching and Patterning (Patent P1290) ...
- Low Temperature Metal Etching and Patterning Application Type: Utility Patent Number: 8679359 Country: United States Status: Filed on 10-May-2011, Issued on 25-Mar-2014 ...
URL: https://www.src.org/library/patent/p1290/
Modified: 2014-03-25 - 23KB
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