Questions?
[x] SRC Program
GRC

[x] Thrust/Theme
PatMat – Patterning Materials

[x] GRC Science Area
MPS – Material & Process Sciences

Content Type
Patent Filings 1

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1: Photoresist Compositions Comprising Norbornene Derivative Polymers...
Photoresist Compositions Comprising Norbornene Derivative Polymers with Acid Labile Groups Application Type: Utility Patent Number: 6103445 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0096/
Modified: 2000-08-15 - 23KB
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