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[x] SRC Program
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MPS – Material & Process Sciences
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Patent Filings 62
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EBSM 2
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PAT – Patterning 19
Factory Systems 13
Pat(MPS) – Patterning 12
BEP – Back End Processes 4
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61: Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit...
Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit Field Effect Transistors and Methods of Fabricating Same Application Type: Foreign National Patent Number: NI154861 ...
URL: https://www.src.org/library/patent/p0580/
Modified: 2008-12-01 - 22KB
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62: Method of Locating Areas in an Image Such as a Photo Mask Layout...
Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB
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