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| Content Type |
| Patent Filings | 2 |
| 1 through 2 of 2 similar documents, best matches first. | ||
- 1: Method of Locating Areas in an Image Such as a Photo Mask Layout...
- Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB
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- 2: CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
- CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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