[x]
Thrust/Theme
Doping Technologies
[x]
GRC Science Area
MBP – Materials & Bulk Processes Sciences
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1 through 6 of
6 similar documents, best matches first. |
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- 1:
Selective Germanium Deposition on Silicon and Resulting Structures...
- Selective Germanium Deposition on Silicon and Resulting Structures Application Type: Utility Patent Number: 5162246 Country: United States Status: Filed on 8-Nov-1991, Issued on ...
URL: https://www.src.org/library/patent/p0146/
Modified: 1992-11-10 - 22KB Find Similar Documents
- 2:
Selective Germanium Deposition on Silicon and Resulting Structures...
- Selective Germanium Deposition on Silicon and Resulting Structures Application Type: Utility Patent Number: 5089872 Country: United States Status: Filed on 27-Apr-1990, Issued on ...
URL: https://www.src.org/library/patent/p0101/
Modified: 1992-02-18 - 22KB Find Similar Documents
- 3:
Deposition of Germanium Thin Films on Silicon Dioxide Employing...
- Deposition of Germanium Thin Films on Silicon Dioxide Employing Interposed Polysilicon Layer Application Type: Divisional Patent Number: 5250452 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0082/
Modified: 1993-10-05 - 22KB Find Similar Documents
- 4:
Selective Deposition of Doped Silicon-Germanium Alloy on Semiconductor...
- Selective Deposition of Doped Silicon-Germanium Alloy on Semiconductor Substrate, and Resulting Structures Application Type: Divisional Patent Number: 5336903 Country: United ...
URL: https://www.src.org/library/patent/p0063/
Modified: 1994-08-09 - 22KB Find Similar Documents
- 5:
Germanium Silicon Dioxide Gate MOSFET (Patent P0098) - SRC
- Germanium Silicon Dioxide Gate MOSFET Application Type: Utility Patent Number: 5101247 Country: United States Status: Filed on 27-Apr-1990, Issued on 31-Mar-1992, Patent Expired ...
URL: https://www.src.org/library/patent/p0098/
Modified: 1992-03-31 - 22KB Find Similar Documents
- 6:
Three-Zone Rapid Thermal Processing System Utilizing Wafer Edge...
- Three-Zone Rapid Thermal Processing System Utilizing Wafer Edge Heating Means Application Type: Utility Patent Number: 5418885 Country: United States Status: Filed on 29-Dec-1992, ...
URL: https://www.src.org/library/patent/p0040/
Modified: 1995-05-23 - 22KB Find Similar Documents
1 through 6 of
6 similar documents, best matches first. |
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