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GRC Science Area
MPS – Material & Process Sciences
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| 1 through 7 of
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- 1:
Using Block Copolymers as Supercritical Fluid Developable Photoresists...
- Using Block Copolymers as Supercritical Fluid Developable Photoresists Application Type: Utility Patent Number: 6379874 Country: United States Status: Filed on 26-Oct-1999, Issued ...
URL: https://www.src.org/library/patent/p0097/
Modified: 2002-04-30 - 22KB
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- 2:
Molecular Glass Photoresists (Patent P0566) - SRC
- Molecular Glass Photoresists Application Type: Utility Patent Number: 7452658 Country: United States Status: Filed on 16-Feb-2006, Issued on 18-Nov-2008, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0566/
Modified: 2008-11-18 - 23KB
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- 3:
Molecular Transfer Printing Using Block Copolymers (Patent P1163...
- Molecular Transfer Printing Using Block Copolymers Application Type: Utility Patent Number: 8133341 Country: United States Status: Filed on 1-Apr-2009, Issued on 13-Mar-2012, ...
URL: https://www.src.org/library/patent/p1163/
Modified: 2012-03-13 - 26KB
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- 4:
Molecular Transfer Printing Using Block Copolymers (Patent P1181...
- Molecular Transfer Printing Using Block Copolymers Application Type: Patent Cooperation Treaty Patent Number: PCT/US20090392 Status: Filed on 14-May-2009, Issued on 26-Feb-2011, ...
URL: https://www.src.org/library/patent/p1181/
Modified: 2011-02-26 - 26KB
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- 5:
Organoelement Resists for EUV Lithography and Methods of Making...
- Organoelement Resists for EUV Lithography and Methods of Making the Same Application Type: Utility Patent Number: 7326514 Country: United States Status: Filed on 12-Mar-2004, ...
URL: https://www.src.org/library/patent/p0446/
Modified: 2008-02-05 - 22KB
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- 6:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Utility Patent Number: 6746825 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0293/
Modified: 2004-06-08 - 23KB
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- 7:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Divisional Patent Number: 6926953 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0445/
Modified: 2005-08-09 - 22KB
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7 similar documents, best matches first. |
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