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Thrust/Theme
PAT – Patterning
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| 1 through 8 of
8 similar documents, best matches first. |
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- 1:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials Application Type: Utility Patent Number: 8133534 Country: United ...
URL: https://www.src.org/library/patent/p1043/
Modified: 2012-03-13 - 25KB
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- 2:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials Application Type: Divisional Patent Number: 8501304 Country: United ...
URL: https://www.src.org/library/patent/p1333/
Modified: 2013-08-06 - 25KB
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- 3:
Methods and Compositions for Forming Aperiodic Patterned Copolymer...
- Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Foreign National Patent Number: 5377857 Country: Japan Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p1025/
Modified: 1995-01-03 - 27KB
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- 4:
Methods and Compositions for Forming Aperiodic Patterned Copolymer...
- Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: European Patent Office Patent Number: PCT/US20050425 Status: Filed on 22-Nov-2005, Issued ...
URL: https://www.src.org/library/patent/p1024/
Modified: 2007-08-08 - 26KB
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- 5:
Methods and Compositions for Forming Aperiodic Patterned Copolymer...
- Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Utility Patent Number: 8287957 Country: United States Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p0517/
Modified: 2012-10-16 - 27KB
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- 6:
DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK...
- DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY Application Type: Patent Cooperation Treaty Patent Number: 10438626 Status: Filed on ...
URL: https://www.src.org/library/patent/p1132/
Modified: 2010-04-17 - 26KB
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- 7:
Density Multiplication and Improved Lithography by Directed Block...
- Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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- 8:
Orientation-Controlled Self-Assembled Nanolithography Using a...
- Orientation-Controlled Self-Assembled Nanolithography Using a Block Copolymer Application Type: Utility Patent Number: 8147914 Country: United States Status: Filed on 11-Jun-2008, ...
URL: https://www.src.org/library/patent/p1079/
Modified: 2012-04-03 - 23KB
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8 similar documents, best matches first. |
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