[x]
SRC Program
[x]
GRC Science Area
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| Patent Filings | 1 |
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- 1: Positive Resist Pattern Formation Through Focused Ion Beam Exposure...
- Positive Resist Pattern Formation Through Focused Ion Beam Exposure and Surface Barrier Silylation Application Type: Continuation (in part) Patent Number: 5362606 Country: United ...
URL: https://www.src.org/library/patent/p0060/
Modified: 1994-11-08 - 21KB
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