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- 1: Three-Zone Rapid Thermal Processing System Utilizing Wafer Edge...
- Three-Zone Rapid Thermal Processing System Utilizing Wafer Edge Heating Means Application Type: Utility Patent Number: 5418885 Country: United States Status: Filed on 29-Dec-1992, ...
URL: https://www.src.org/library/patent/p0040/
Modified: 1995-05-23 - 22KB
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- 2: Method for Forming a Layer of Uniform Thickness On a Semiconductor...
- Method for Forming a Layer of Uniform Thickness On a Semiconductor Wafer During Rapid Thermal Processing Application Type: Utility Patent Number: 5439850 Country: United States ...
URL: https://www.src.org/library/patent/p0033/
Modified: 1995-08-08 - 21KB
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