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1 through 30 of 43 similar documents, best matches first.

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1: Step and Flash Imprint Lithography (Patent P0245) - SRC: Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB
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2: Step and Flash Imprint Lithography (Patent P0264) - SRC: Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB
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3: Step and Flash Imprint Lithography (Patent P0238) - SRC: Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB
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4: Step and Flash Imprint Lithography (Patent P0233) - SRC: Step and Flash Imprint Lithography Application Type: Foreign National Patent Number: WO2000054107 A Country: Japan Status: Filed on 3-Mar-2000, Issued on 2-May-2000, Patent Expired ...
URL: https://www.src.org/library/patent/p0233/
Modified: 2000-05-02 - 25KB
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5: Slide 1: 230 250 270 290 310 0 0 0 0 0 0 0 0 1 2 240 260 280 300 V G (mV) V G (mV) I (nA) V SD = - 30 mV The absence of steps the sequential nature coupling of the atom. Figure 4b shows ...
URL: https://www.src.org/calendar/e004100/e004100-00-session3.pdf
Modified: 2010-11-29 - 29.2MB
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6: TECHCON 2011 (Event E004113) - SRC: TECHCON 2011 Date: Monday, Sept. 12, 2011, 8 a.m. - Tuesday, Sept. 13, 2011, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004113 E004113 ...
URL: https://www.src.org/calendar/e004113/
Modified: 2012-03-13 - 97KB
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7: Slide 1: ITRS - Deterministic Doping, Thomas Schenkel, LBNL, Nov. 12, 2010 Single Ion Implantation Thomas Schenkel Lawrence Berkeley National Laboratory T_Schenkel@LBL.gov ITRS - ...
URL: https://www.src.org/calendar/e004100/e004100-00-session2.pdf
Modified: 2010-11-29 - 52.6MB
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8: Water-Processable Photoresist Compositions (Patent P0272) - SRC: Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB
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9: Water-Processable Photoresist Compositions (Patent P0282) - SRC: Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB
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10: Water-Processable Photoresist Compositions (Patent P0186) - SRC: Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB
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11: Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography...: Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography Application Type: Utility Patent Number: 7092138 Country: United States Status: Filed on 8-Oct-2004, Issued ...
URL: https://www.src.org/library/patent/p0491/
Modified: 2006-08-15 - 22KB
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12: DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK...: DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY Application Type: Patent Cooperation Treaty Patent Number: 10438626 Status: Filed on ...
URL: https://www.src.org/library/patent/p1132/
Modified: 2010-04-17 - 26KB
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13: Density Multiplication and Improved Lithography by Directed Block...: Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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14: Organoelement Resists for EUV Lithography and Methods of Making...: Organoelement Resists for EUV Lithography and Methods of Making the Same Application Type: Utility Patent Number: 7326514 Country: United States Status: Filed on 12-Mar-2004, ...
URL: https://www.src.org/library/patent/p0446/
Modified: 2008-02-05 - 22KB
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15: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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16: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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17: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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18: Molecular Transfer Printing Using Block Copolymers (Patent P1163...: Molecular Transfer Printing Using Block Copolymers Application Type: Utility Patent Number: 8133341 Country: United States Status: Filed on 1-Apr-2009, Issued on 13-Mar-2012, ...
URL: https://www.src.org/library/patent/p1163/
Modified: 2012-03-13 - 26KB
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19: Molecular Transfer Printing Using Block Copolymers (Patent P1181...: Molecular Transfer Printing Using Block Copolymers Application Type: Patent Cooperation Treaty Patent Number: PCT/US20090392 Status: Filed on 14-May-2009, Issued on 26-Feb-2011, ...
URL: https://www.src.org/library/patent/p1181/
Modified: 2011-02-26 - 26KB
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20: Optical Proximity Correction Using Regression (Patent P1118)...: Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB
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21: Fabrication of Group III-Nitride Photocathode Having Cs Activation...: Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB
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22: Fabrication of Complex Three-Dimensional Structures Based on...: Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials On Activated Two-Dimensional Templates Application Type: Utility Patent ...
URL: https://www.src.org/library/patent/p0603/
Modified: 2012-05-01 - 27KB
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23: Materials and Methods for Creating Imaging Layers (Patent P1140...: Materials and Methods for Creating Imaging Layers Application Type: Continuation Patent Number: 7851252 Country: United States Status: Filed on 17-Feb-2009, Issued on 14-Dec-2010, ...
URL: https://www.src.org/library/patent/p1140/
Modified: 2010-12-14 - 26KB
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24: Materials and Methods for Creating Imaging Layers (Patent P1002...: Materials and Methods for Creating Imaging Layers Application Type: European Patent Office Patent Number: 06251517.6 Status: Filed on 22-Mar-2006, Issued on 13-Oct-2009 ...
URL: https://www.src.org/library/patent/p1002/
Modified: 2009-10-13 - 26KB
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25: Materials and Methods for Creating Imaging Layers (Patent P0626...: Materials and Methods for Creating Imaging Layers Application Type: Utility Patent Number: 7514764 Country: United States Status: Filed on 21-Mar-2006, Issued on 7-Apr-2009 ...
URL: https://www.src.org/library/patent/p0626/
Modified: 2009-04-07 - 26KB
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26: Water-Soluble Photoinitiators (Patent P0013) - SRC: Water-Soluble Photoinitiators Application Type: Utility Patent Number: 5648196 Country: United States Status: Filed on 14-Jul-1995, Issued on 15-Jul-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0013/
Modified: 1997-07-15 - 24KB
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27: Methods and Compositions for Forming Aperiodic Patterned Copolymer...: Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Foreign National Patent Number: 5377857 Country: Japan Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p1025/
Modified: 1995-01-03 - 27KB
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28: Methods and Compositions for Forming Aperiodic Patterned Copolymer...: Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: European Patent Office Patent Number: PCT/US20050425 Status: Filed on 22-Nov-2005, Issued ...
URL: https://www.src.org/library/patent/p1024/
Modified: 2007-08-08 - 26KB
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29: Methods and Compositions for Forming Aperiodic Patterned Copolymer...: Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Utility Patent Number: 8287957 Country: United States Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p0517/
Modified: 2012-10-16 - 27KB
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30: Fabrication of Complex Three-Dimensional Structures Based on...: Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials on Activated Two-Dimensional Templates Application Type: Continuation ...
URL: https://www.src.org/library/patent/p1446/
Modified: 2017-01-10 - 27KB
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1 through 30 of 43 similar documents, best matches first.

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